Advantages And Disadvantages of Different Material Storage T8 T14 PE / PTFE Lined ISO Tank Container for Electronic Grade Hydrogen Peroxide (H₂O₂) HCL,KOH
Views: 25812 Author: Dong Runze Special Vehicle Publish Time: 2025-09-28 Origin: Dong Runze
Advantages And Disadvantages of Different Material Storage T8 T14 PE / PTFE Lined ISO Tank Container for ISO Tank Container for Electronic Grade Hydrogen Peroxide (H₂O₂)
Electronic Grade Hydrogen Peroxide (H₂O₂)
Electronic Grade H₂O₂ (also known as Semiconductor-Grade H₂O₂) is a high-purity, ultra-clean hydrogen peroxide product specifically developed for the microelectronics industry. Its core value lies in extremely low impurity content (especially metal ions, particles, and organic contaminants) and stable chemical properties, which can meet the strict requirements of semiconductor manufacturing processes (such as wafer cleaning, etching, and surface treatment) without damaging delicate electronic components or affecting product yields.
1. Core Characteristics: Why It Differs from Industrial-Grade H₂O₂
The biggest difference between electronic-grade and ordinary industrial-grade H₂O₂ lies in purity control and application-oriented design. Its key characteristics are as follows:
Characteristic | Description |
Ultra-High Purity | - Metal ion content: Typically controlled below 10 ppt (parts per trillion), and even as low as 1 ppt for advanced processes (e.g., ions like Na, K, Fe, Cu, Zn—these ions can cause short circuits or performance degradation of semiconductors). |
Stable Concentration | The mass fraction of H₂O₂ is usually 30%–35% or 50% (high-concentration products are for specific etching needs). The concentration fluctuation range is ≤±0.5% to avoid process instability caused by concentration changes. |
Low Acidity/Alkalinity | The pH value is controlled in a weakly acidic range (typically 2.0–4.0) to prevent corrosion of silicon wafers or metal layers, and to inhibit the decomposition of H₂O₂ (alkaline environments accelerate H₂O₂ decomposition into H₂O and O₂). |
Low Decomposition Rate | Additives (e.g., stabilizers like phosphoric acid or organic chelating agents) are added in trace amounts to suppress H₂O₂ decomposition during storage and use (decomposition would reduce effectiveness and generate bubbles that affect cleaning). |
2. Key Applications in the Microelectronics Industry
Electronic-grade H₂O₂ is a "core auxiliary chemical" in semiconductor manufacturing, mainly used in the following processes, often mixed with other high-purity chemicals (e.g., sulfuric acid, ammonia water) to form a "cleaning/etching solution":
(1) Wafer Cleaning: Remove Surface Contaminants
The most common application is RCA cleaning (a classic semiconductor cleaning process), where it acts as a strong oxidizing agent to remove organic matter, metal ions, and native oxides from the wafer surface:
SC-1 Cleaning (Standard Clean 1): Mixed with high-purity ammonia water (NH₄OH) and deionized water (DI Water) in a ratio of ~1:1:5–10. H₂O₂ oxidizes organic contaminants into CO₂ and H₂O, while ammonia water dissolves metal hydroxides, achieving "dual removal of organics and metals."
SC-2 Cleaning (Standard Clean 2): Mixed with high-purity hydrochloric acid (HCl) and DI Water in a ratio of ~1:1:6. H₂O₂ oxidizes trace metal ions on the wafer surface into soluble metal chlorides, which are then washed away by DI Water, further reducing metal impurities.
(2) Metal Etching: Precisely Remove Metal Layers
In the manufacturing of integrated circuits (ICs), it is used to etch metal films (e.g., copper, aluminum) that are not protected by photoresist:
For example, in copper interconnect etching, electronic-grade H₂O₂ is mixed with dilute sulfuric acid (H₂SO₄) to form an acidic oxidizing solution. H₂O₂ oxidizes Cu to Cu²⁺, and the acid dissolves Cu²⁺ into the solution, realizing "precise and non-damaging etching" (avoids the use of toxic etchants like chromic acid).
(3) Photoresist Stripping: Remove Residual Photoresist
After the photolithography process, the photoresist (a light-sensitive material) on the wafer surface needs to be stripped. Electronic-grade H₂O₂ is mixed with oxidizing agents (e.g., ozone) to decompose the organic structure of the photoresist into small molecules, which are then washed away, ensuring no residue on the wafer surface.
(4) Silicon Wafer Surface Passivation
In solar cell manufacturing (a branch of microelectronics), electronic-grade H₂O₂ is used to form a thin silicon oxide layer (SiO₂) on the surface of monocrystalline silicon wafers. This layer acts as a "passivation layer" to reduce electron-hole recombination and improve the conversion efficiency of solar cells.
3. Production & Quality Control: The "Strictness" Behind High Purity
The production of electronic-grade H₂O₂ requires a full-process control system to avoid any impurity introduction, with key links including:
(1) Raw Material Selection
Use high-purity hydrogen (H₂) (99.9999% purity) and ultra-clean oxygen (O₂) as raw materials, and adopt the "anthraquinone method" (the mainstream industrial H₂O₂ production process) for synthesis. The raw materials must undergo multi-stage purification (e.g., molecular sieve adsorption to remove impurities) before use.
(2) Purification Technology
The synthesized crude H₂O₂ needs to go through multi-stage purification to meet electronic-grade standards:
Ion Exchange: Use high-purity ion exchange resins to remove metal ions (e.g., cation resins for Na⁺/Fe²⁺, anion resins for Cl⁻/SO₄²⁻).
Membrane Filtration: Adopt ultrafiltration membranes (pore size 0.02–0.1 μm) and nanofiltration membranes to filter out particles and macromolecular organic impurities.
Distillation: For ultra-high-purity grades (e.g., for 7nm/5nm processes), use "vacuum rectification" to further separate trace impurities (distillation under low pressure avoids H₂O₂ decomposition due to high temperature).
(3) Packaging & Storage
Packaging Materials: Use ultra-clean polypropylene (PP) or perfluoroalkoxy alkane (PFA) containers (avoid glass or ordinary plastics, which may release ions or particles). The inner wall of the container must be polished and cleaned to avoid adsorption of impurities.
Storage Conditions: Store in a cool, dark, and well-ventilated environment (temperature ≤25℃) to prevent H₂O₂ decomposition caused by light or high temperature. It must be isolated from reducing agents (e.g., alcohols) and heavy metal catalysts (e.g., MnO₂) to avoid violent reactions.
4. Industry Standards: Global Uniform Quality Benchmarks
To ensure consistency in product quality across different regions, the microelectronics industry follows strict international standards for electronic-grade H₂O₂, with the most authoritative ones being:
Standard System | Issuing Organization | Key Grade Classification |
SEMI Standards | SEMI (Semiconductor Equipment and Materials International) | - SEMI C30: Specifies the general requirements for electronic-grade chemicals. |
JIS Standards | JIS (Japanese Industrial Standards) | - JIS K 1463: Defines the purity requirements for electronic-grade H₂O₂, widely used in Japanese semiconductor enterprises (e.g., Toshiba, Sony). |
GB Standards | China National Standard | - GB/T 37864-2019: The national standard for "Electronic Grade Hydrogen Peroxide" in China, which aligns with SEMI C12 and is applicable to domestic semiconductor manufacturers (e.g., SMIC, Huawei HiSilicon). |
5. Market & Key Manufacturers
Due to the high technical barriers (purification, quality control, and packaging), the global electronic-grade H₂O₂ market is dominated by a few leading enterprises. The main manufacturers include:
International: Solvay (Belgium), Evonik (Germany), Entegris (US, acquired Air Liquide’s electronic chemicals business), Mitsubishi Chemical (Japan).
Domestic (China): Jiangsu Zhongqing Environmental Protection Technology, Zhejiang Juhua Co., Ltd., Shanghai Hanhong Chemical (gradually achieving localization substitution for mid-to-low-end processes, and making breakthroughs in high-end processes like 14nm).
In summary, electronic-grade H₂O₂ is a "high-precision chemical" tailored to the microelectronics industry. Its ultra-low impurity content and stable performance directly determine the yield and reliability of semiconductors. With the development of advanced processes (e.g., 3nm/2nm), the demand for higher-purity (e.g., 0.1 ppt metal ion content) and more stable electronic-grade H₂O₂ will continue to grow.
Advantages and Disadvantages of Different Material Storage Tanks for Storing Electronic-Grade Hydrogen Peroxide
When storing electronic-grade hydrogen peroxide (H₂O₂), the selection of storage tank materials primarily needs to meet three core requirements: high purity (no impurity leaching), strong corrosion resistance (resistance to oxidation/decomposition of H₂O₂), and low adsorption (avoiding residual contamination). Storage tanks made of different materials vary significantly in performance, cost, and applicable scenarios. Below is a comparison of the advantages and disadvantages of mainstream materials:
I. Mainstream Storage Tank Materials and Their Pros & Cons
1. PTFE (Polytetrafluoroethylene)-Lined Tanks
Tank Structure: Typically, carbon steel or stainless steel (e.g., SS304/316L) is used as the outer supporting layer, with the inner layer lined with 1–3 mm thick PTFE (or modified PTFE such as PFA). In some high-end scenarios, fully molded pure PTFE tanks (for small capacities) are adopted.
Core Advantages:
Extreme Corrosion Resistance: PTFE is one of the most chemically stable materials. It has no corrosive reaction with electronic-grade H₂O₂ (even at high concentrations of 30%–50%), and does not leach metal ions (e.g., Fe, Cr, Ni) or organic impurities from the material. It fully meets the "low impurity" requirement for electronic-grade products (e.g., metal ion content < 1 ppb).
Low Adsorption & Easy Cleaning: PTFE has a smooth, non-stick surface, which barely adsorbs H₂O₂ residues or external particles. Moreover, it leaves no residues after cleaning, making it suitable for scenarios requiring frequent batch switching or high-purity demands (e.g., storage of wafer-grade H₂O₂ for semiconductors).
Wide Temperature Adaptability: It can be used continuously within a temperature range of -200℃ to +260℃, capable of withstanding storage in extreme environments (e.g., low-temperature transportation, high-temperature cleaning) without material aging due to temperature fluctuations.
Main Disadvantages:
High Cost: The PTFE lining process is complex (e.g., molding, welding). Especially for large-capacity tanks (>10 m³), the qualification rate of the lining is low, and the overall cost is 2–3 times that of stainless steel tanks.
Low Mechanical Strength: PTFE itself has low hardness and poor impact resistance. The lining layer is prone to scratches, blistering, or even peeling due to external impacts (e.g., transportation jolts). It relies on the outer supporting structure and cannot withstand high pressure (usually only suitable for atmospheric or slightly positive pressure storage).
Poor Thermal Conductivity: PTFE has an extremely low thermal conductivity (approximately 0.24 W/(m·K)). If temperature control (e.g., cooling to prevent decomposition) of H₂O₂ is required, additional optimization of the outer heat exchange structure is needed, resulting in low efficiency.
Applicable Scenarios: Storage of high-purity electronic-grade H₂O₂ (e.g., UPSS grade, EL grade), small-batch precision process tanks, and scenarios requiring frequent cleaning and batch switching.
2. 316L Stainless Steel Tanks (with High-Precision Internal Polishing)
Tank Structure: The main body is made of 316L stainless steel (containing Mo element, with better pitting corrosion resistance than 304). The interior undergoes high-precision mechanical polishing + electrochemical polishing, with the surface roughness controlled to Ra ≤ 0.2 μm (Ra ≤ 0.1 μm in some strict scenarios). Additionally, passivation treatment is required (to form a Cr₂O₃ oxide film for enhanced corrosion resistance).
Core Advantages:
High Mechanical Strength: 316L stainless steel has much higher tensile strength (≥480 MPa) and impact resistance than PTFE. It can be made into large-capacity tanks (e.g., 50–100 m³) or pressure-bearing tanks (design pressure ≤ 0.6 MPa), suitable for industrial-scale batch storage and transportation.
Moderate Cost: Compared with PTFE-lined tanks, 316L polished tanks have lower material and processing costs (approximately 1/2 of PTFE-lined tanks) and are easier to maintain (no risk of lining peeling), making them suitable for large-scale production scenarios.
Good Thermal Conductivity: With a thermal conductivity of approximately 16.3 W/(m·K), if H₂O₂ needs to be cooled due to heat release from decomposition, rapid temperature control can be achieved through the outer jacket heat exchange, avoiding temperature runaway.
Main Disadvantages:
Risk of Impurity Leaching: Even after polishing and passivation, when storing high-concentration H₂O₂ (e.g., >50%) for a long time, Cr and Ni ions on the stainless steel surface may still leach in trace amounts (though controllable to <5 ppb, it cannot be completely eliminated). Regular inspection of the integrity of the tank's passivation layer is necessary; otherwise, it may contaminate electronic-grade H₂O₂.
Limited Resistance to Localized Corrosion: If polishing is incomplete (with tiny scratches or depressions), H₂O₂ may accumulate locally and accelerate decomposition, leading to "pitting corrosion" or "intergranular corrosion". Strict control of surface roughness and passivation processes is required.
Slightly Higher Adsorption: The polished stainless steel surface still has tiny pores, which may adsorb trace H₂O₂ residues or organics. It is more difficult to clean than PTFE, making it unsuitable for scenarios requiring frequent switching of high-purity batches.
Applicable Scenarios: Batch storage of medium-to-high purity electronic-grade H₂O₂ (e.g., SEM grade), industrial-grade electronic chemical storage tanks, and scenarios with cost sensitivity and large capacity requirements.
3. Pure Aluminum (or Aluminum Alloy) Tanks
Tank Structure: Usually made of pure aluminum (purity ≥ 99.95%) or 3003 aluminum alloy (containing Mn element to enhance strength). The interior undergoes anodization treatment (to form an Al₂O₃ oxide film with a thickness of 5–10 μm), with a surface roughness of Ra ≤ 0.4 μm.
Core Advantages:
Lightweight: Aluminum has a density of only 2.7 g/cm³, approximately 1/3 that of stainless steel. It is suitable for mobile storage tanks (e.g., ISO tank containers) or outdoor temporary storage, with low transportation costs.
Low Cost: Pure aluminum is much cheaper than 316L stainless steel and PTFE, and is easy to process. It is suitable for small-to-medium capacity (<10 m³) and low-frequency use scenarios.
Stability of Oxide Film: The Al₂O₃ film formed by anodization has good corrosion resistance to low-concentration H₂O₂ (e.g., ≤30%), and the leached Al ions can be easily removed through subsequent filtration (if the downstream process includes a filtration step).
Main Disadvantages:
Limited Corrosion Resistance: Under high-concentration H₂O₂ (>30%) or acidic environments (trace H⁺ may be generated by H₂O₂ decomposition), the Al₂O₃ film is easily damaged, causing corrosion of the aluminum matrix and significant leaching of Al ions (far exceeding the electronic-grade requirement of <1 ppb), resulting in high contamination risk.
Low Mechanical Strength: Pure aluminum has low hardness (Brinell hardness of approximately 25 HB) and is prone to deformation due to impact. It cannot withstand high pressure (design pressure is usually ≤ 0.1 MPa, only suitable for atmospheric storage).
High Adsorption: The oxide film on the aluminum surface has micro-pores, which easily adsorb H₂O₂ residues and external particles. It is difficult to meet the high-purity requirements of electronic-grade products after cleaning, and is only suitable for low-purity electronic-grade H₂O₂ (e.g., for cleaning ordinary electronic components).
Applicable Scenarios: Temporary storage of low-concentration (≤30%), medium-to-low purity electronic-grade H₂O₂, mobile transportation tanks, and non-core process scenarios sensitive to cost and weight.
4. Quartz Tanks
Tank Structure: Made of high-purity quartz glass (SiO₂ purity ≥ 99.99%) through integral molding, with no seams and a smooth inner wall (no additional polishing required, Ra ≈ 0.01 μm).
Core Advantages:
Ultra-High Purity: Quartz glass barely leaches any impurities (metal ions < 0.1 ppb, organics < 0.01 ppm), fully meeting the storage requirements of "ultra-clean high-purity" (VLSI-grade) H₂O₂ for semiconductors. It is the "ideal material" for laboratory or small-batch precision processes.
Extremely High Chemical Inertness: It has no corrosive reaction with H₂O₂ of any concentration, does not adsorb any residues, and has no cross-contamination risk after cleaning.
Transparency: It allows direct observation of the liquid level and state of H₂O₂ in the tank (e.g., presence of precipitation or discoloration), facilitating real-time monitoring.
Main Disadvantages:
Extremely High Cost: The material and molding cost of high-purity quartz glass is 3–5 times that of PTFE, and it can only be made into small-capacity tanks (usually <1 m³), which cannot meet industrial batch storage needs.
Fragility: Quartz glass has high hardness but high brittleness and extremely poor impact resistance. It may crack even with slight impacts, requiring strict control of the usage environment (e.g., fixed placement, no vibration).
Heat-Resistant but Poor Thermal Shock Resistance: Although it can withstand high temperatures (≤1200℃), sudden temperature changes (e.g., rapid cooling from room temperature to 0℃) can easily cause cracking, limiting the temperature control range.
Applicable Scenarios: Laboratory-scale ultra-pure H₂O₂ storage, small-batch precision process tanks for semiconductor chips, and scenarios with extreme purity requirements (e.g., <0.1 ppb impurities).
Material Type | Purity Compatibility (Impurity Leaching) | Corrosion Resistance (High-Concentration H₂O₂) | Mechanical Strength | Cost Level | Applicable Capacity | Core Applicable Scenarios |
PTFE-Lined / PE Linging | ★★★★★ (Extremely Low Leaching) | ★★★★★ (Complete Corrosion Resistance) | ★★☆☆☆ | High | Small-Medium (1–50 m³) | High-purity batch storage, frequent batch switching |
316L Stainless Steel (Polished) | ★★★★☆ (Trace Leaching) | ★★★★☆ (Requires Passivation Maintenance) | ★★★★★ | Medium | Medium-Large (10–100 m³) | Medium-high purity batch storage, industrial scenarios |
Pure Aluminum (Anodized) | ★★☆☆☆ (Moderate Leaching) | ★★☆☆☆ (Suitable for Low Concentration) | ★★☆☆☆ | Low | Small-Medium (1–10 m³) | Low-concentration temporary storage, mobile transportation |
Quartz Glass | ★★★★★ (Near-Zero Leaching) | ★★★★★ (Complete Corrosion Resistance) | ★☆☆☆☆ | Extremely High | Extra-Small (<1 m³) | Laboratory ultra-pure storage, chip-level precision processes |
II. Comparison Table of Core Performances of Different Materials
III. Core Principles for Material Selection
Prioritize Matching Purity Grade: For ultra-clean high-purity H₂O₂ (VLSI/EL grade), quartz or PTFE-lined tanks are preferred; for medium-high purity (SEM grade), polished 316L stainless steel tanks are chosen; for low purity, anodized pure aluminum tanks are suitable.
Consider Capacity and Pressure Requirements: For large-capacity (>50 m³) or pressure-bearing scenarios (design pressure > 0.1 MPa), 316L stainless steel tanks are prioritized; for small-capacity or atmospheric pressure scenarios, PTFE-lined or quartz tanks can be selected.
Balance Cost and Risk: For core processes (e.g., wafer cleaning), cost compromise is not recommended, and high-corrosion-resistant materials should be used; for non-core temporary storage, material grades can be appropriately reduced (e.g., pure aluminum), but impurity detection must be strengthened.
Emphasize Auxiliary Processes: Regardless of the material selected, the tank must be equipped with nitrogen sealing (to prevent H₂O₂ decomposition due to contact with air), high-precision filtration (inlet/outlet filtration accuracy ≤ 0.1 μm), and temperature control systems (tank temperature ≤ 30℃) to fully ensure storage safety and purity.
| Port of Discharge: | NHAVA SHEVA | Final Destination: | NHAVA SHEVA,INDIA | |||
| Number & Type of Packages | Shipping Mark | Description of Goods | Gross weight | Measurement | ||
| 3 UNITS | DTAU2509016 DTAU2509021 DTAU2509037 | 3X20TK 20FT TANK CONTAINER (EMPTY AND NEW TANKS) COUNTRY OF ORIGIN:CHINA | 15900 KGS | 114.8 CBM | ||
| DTAU2509016/WHAA791061/20'TK/1/5300/38.2 DTAU2509021/WHAA791062/20'TK/1/5300/38.2 DTAU2509037/WHAA791063/20'TK/1/5300/38.4 | ||||||
3 Units PE Lined T7 T8 T14 ISO Tank Container for DHF, HCL,KOH , H2O2 Hydrofluoric Acid/ Hydrochloric Acid/ Potassium Hydroxide / Hydrogen Peroxide Export To India
Hubei Dong Runze Special Vehicle Equipment subcompany Keystone Vessel (Wuhan) Co.,Ltd
ISOTank Top Loading / Bottom unloading Discharge valve
| Product dimension | 6058mm*2438mm*2591mm | ||||
| Weight | 5200KGS | ||||
| thickness of plastic lining | 16mm | ||||
| Product trype | steel tank lined LLDPE | ||||
| Materials of the lining layer | PE7042 | ||||
| 20ft Tank container | |||||
| Ext. Length | 6,058mm | Ext. Width | 2,438mm | ||
| Ext. Height | 2,591mm | M.G.W. | 32000kg | ||
| Tare | 5300Kg | Max. Payload | 26200Kgs | ||
| Cubic Capacity | 19m³ | Tank Design Standard | GB 150 ,GB/ T 16563, GB/ T 1413, GB/ T 1836, GB/ T 1835. | ||
| Max. Design Pressure | 0.27MaP | Calculated Pressure | 0.27MaP | ||
| Testing Pressure | 0.4MaP | Design Operating Temp. | -20ºC~50ºC | ||
| Lining | PE7042 lined 16mm | Material of Tank Body | Q235 | ||
| Manhole Dia. | 500mm | Tank Body Thickness | 6 .0mm | ||
| Facilities Tank Capacity: 17500-19000 Liters FACILITIES TANK CAPACITY: 19000 LITERS STEEL SHEET 6MM, HEAD 6MM LINER THICKNESS: 16 MM LLDPE MATERIALS :CARBON STEEL OUTSIDE LLDPE LINING INSIDE TANK HYDROGEN PEROXIDE 50% UN2014 H2O2 HYDROCHLORIC ACID 36% UN1789 HCL , UN1830 H2SO4 DILUTED SULFURIC ACID 1%~ 50%~ 94%, UN2031 HNO3 NITRIC ACID 1%~30%~50%, NaOH 50% CAUSTIC SODA AND OTHER CHEMICALS .TEMPERATURE:NORMAL | |||||
Container Specification Sheet
Dimensions | Metric | Imperial |
Length | 6,058mm | 19'10" |
Width | 2,438mm | 8'0" |
Height | 2,591mm | 8'6" |
Pressures | Bar | MPa |
Working pressure | 4.0 | 0.4 |
Test pressure | 6.0 | 0.6 |
Why PE / PTFE Lined ISO Tank Container for DHF,HCL,KOH,H2O2 Hydrofluoric Acid/ Hydrochloric Acid/ Potassium Hydroxide / Hydrogen Peroxide.
Why PE/PTFE-Lined ISO Tank Containers Are Suitable for DHF, HCl, KOH, and H₂O₂
ISO tank containers (intermodal bulk containers) lined with PE (Polyethylene) or PTFE (Polytetrafluoroethylene, Teflon) are widely used for transporting corrosive, reactive, or oxidizing chemicals like hydrofluoric acid (DHF), hydrochloric acid (HCl), potassium hydroxide (KOH), and hydrogen peroxide (H₂O₂). This suitability stems from the unique chemical inertness, corrosion resistance, and mechanical stability of PE/PTFE, which perfectly match the harsh properties of these substances—paired with the structural reliability of ISO tanks. Below is a detailed breakdown:
1. Core Advantages of PE/PTFE Liners
First, it is critical to understand why PE and PTFE stand out among lining materials for chemical storage/transport:
Property | PE (Polyethylene) | PTFE (Polytetrafluoroethylene) |
Chemical Inertness | Resists most acids, alkalis, and non-polar solvents; no reaction with weak-to-moderate corrosives. | "Plastic king"—resists nearly all chemicals (including strong acids, alkalis, oxidizers, and organic solvents) at room or high temperatures. |
Corrosion Resistance | Impermeable to low-concentration acids/alkalis; no oxidation or degradation from contact with HCl, KOH, or dilute H₂O₂. | Unaffected by concentrated DHF, hot HCl, or high-purity H₂O₂; no erosion from fluorides, chlorides, or hydroxide ions. |
Temperature Range | -40°C to 80°C (suitable for ambient-temperature transport). | -200°C to 260°C (handles extreme temperatures, e.g., heated H₂O₂ or chilled DHF). |
Non-Catalytic | Does not react with oxidizing agents (e.g., H₂O₂) or catalyze decomposition. | Completely inert—no catalytic effect on H₂O₂ decomposition (critical for preventing explosive O₂ release). |
Mechanical Durability | Flexible, impact-resistant; withstands ISO tank vibration during transport (reduces cracking risk). | Rigid yet tough; resistant to wear from chemical flow (ideal for abrasive or high-velocity fluids). |
2. Matching PE/PTFE to Each Chemical’s Properties
Each of the four chemicals poses unique challenges (strong corrosion, oxidation, reactivity). PE/PTFE liners address these risks specifically:
① Hydrofluoric Acid (DHF, HF)
Key Risks: Extremely corrosive (attacks metals, glass, and most plastics); fluoride ions (F⁻) penetrate materials easily, causing structural failure or toxic leaks.
Why PE/PTFE Work:
Neither PE nor PTFE reacts with F⁻: Unlike metals (e.g., steel, aluminum, which form soluble fluorides) or glass (which dissolves in DHF to form SiF₄), PE/PTFE’s carbon-fluorine (PTFE) or carbon-hydrogen (PE) bonds are impervious to fluoride attack.
PTFE for high-concentration DHF: For 70%+ concentrated DHF or elevated temperatures (>50°C), PTFE is preferred—it resists permeation better than PE, preventing fluoride ions from reaching the ISO tank’s outer steel shell (which would corrode and weaken the container).
PE for dilute DHF: For <40% DHF at ambient temperature, PE is cost-effective while maintaining sufficient barrier performance.
② Hydrochloric Acid (HCl)
Key Risks: Strong acid (pH <1); concentrated HCl (37%+) is volatile and corrosive to metals (e.g., steel reacts to form FeCl₃, causing pitting and leaks).
Why PE/PTFE Work:
No acid-base reaction: PE/PTFE are non-polar polymers and do not react with H⁺ ions in HCl. Unlike metal tanks (which require expensive corrosion inhibitors), liners eliminate the need for additives that could contaminate the acid.
Impermeability: HCl vapor or liquid cannot penetrate PE/PTFE, preventing "under-liner corrosion" of the ISO tank’s steel body. This avoids structural damage and extends the tank’s service life.
Cost efficiency: PE is widely used for standard HCl transport (30–37% concentration) due to its lower cost; PTFE is reserved for specialized cases (e.g., ultra-pure HCl for electronics manufacturing, where contamination from PE is unacceptable).
③ Potassium Hydroxide (KOH)
Key Risks: Strong base (pH >14); hygroscopic (absorbs moisture from air) and reactive with metals (e.g., aluminum forms soluble KAlO₂) and organic materials (e.g., some plastics undergo saponification).
Why PE/PTFE Work:
Resistance to saponification: Unlike polyvinyl chloride (PVC) or rubber (which break down in strong alkalis), PE/PTFE do not undergo chemical degradation from OH⁻ ions. KOH cannot dissolve or swell these liners.
Protection against hygroscopic damage: KOH’s moisture absorption causes it to solidify or become viscous, but PE/PTFE’s smooth surface prevents KOH from adhering to the liner—ensuring complete discharge and avoiding residue buildup (a common issue with unlined tanks).
Compatibility with high concentrations: Both liners handle 50–85% concentrated KOH (used in industrial processes like soap making) without performance loss. PTFE is preferred for molten KOH (above 132°C, KOH’s melting point) due to its higher temperature resistance.
④ Hydrogen Peroxide (H₂O₂)
Key Risks: Strong oxidizer; decomposes rapidly in contact with metals, impurities, or organic materials (releasing O₂ gas, which can build pressure and cause explosions); requires ultra-clean, non-catalytic storage.
Why PE/PTFE Work:
Non-catalytic inertness: The biggest advantage—PE/PTFE do not contain metals or impurities that trigger H₂O₂ decomposition. Unlike stainless steel (which catalyzes H₂O₂ into H₂O and O₂), liners keep H₂O₂ stable for extended transport (e.g., 35% food-grade or 50% industrial-grade H₂O₂).
Contamination control: PTFE is FDA-approved and ultra-pure, making it suitable for pharmaceutical or food-grade H₂O₂ (where even trace metal contamination is forbidden). PE is used for industrial grades, as it avoids introducing particulates or additives.
Pressure safety: By preventing premature decomposition, liners eliminate unexpected O₂ pressure spikes inside the ISO tank—critical for meeting intermodal transport safety standards (e.g., IMDG Code).
3. Compatibility with ISO Tank Design & Transport Standards
ISO tank containers are designed for global intermodal transport (ships, trains, trucks), so liners must meet strict safety and durability requirements:
Structural synergy: The outer steel shell of ISO tanks provides mechanical strength (supports 20–30 tons of bulk fluid), while PE/PTFE liners act as a chemical barrier—combining the best of both materials (strength + corrosion resistance).
Compliance with regulations: PE/PTFE liners meet international standards for chemical transport, such as the IMDG Code (International Maritime Dangerous Goods Code) and ADR (European Agreement Concerning the International Carriage of Dangerous Goods by Road). They are certified for "tank containers for corrosive substances" (Class 8 dangerous goods, which includes DHF, HCl, KOH, and concentrated H₂O₂).
Reusability: Unlike single-use plastic drums, PE/PTFE-lined ISO tanks are reusable (with proper cleaning between loads). Liners resist staining or residue buildup, making them cost-effective for long-term, repeated transport of these chemicals.
4. Why Not Other Lining Materials?
To emphasize PE/PTFE’s superiority, compare them to common alternatives:
Alternative Material | Shortcomings for Target Chemicals |
Metals (Steel/Aluminum) | Corroded by DHF (steel forms FeF₂), HCl (steel forms FeCl₃), and KOH (aluminum forms KAlO₂); catalyzes H₂O₂ decomposition. |
Glass/Ceramic | Brittle (unsuitable for transport vibration); dissolves in DHF; heavy and expensive. |
PVC/Rubber | Degraded by strong acids (HCl) and alkalis (KOH); swells in H₂O₂ and causes contamination. |
Polypropylene (PP) | Less heat-resistant than PE/PTFE; permeable to concentrated DHF and hot H₂O₂. |
Conclusion
PE/PTFE-lined ISO tank containers are the optimal choice for DHF, HCl, KOH, and H₂O₂ because they:
Match the unique chemical challenges of each substance (corrosion, oxidation, reactivity) with superior inertness and barrier performance;
Integrate with ISO tank design to balance mechanical strength and transport safety;
Meet global regulatory standards for dangerous goods transport;
Offer cost efficiency (PE) or ultra-high performance (PTFE) for diverse use cases.
For most industrial applications, PE is the go-to for economy and reliability, while PTFE is reserved for high-concentration, high-temperature, or ultra-pure scenarios—ensuring safe, efficient, and compliant transport of these critical chemicals.
Disadvantages of SS316L tank for KOH
An SS316L tank for KOH refers to a storage container made of SS316L stainless steel used to hold potassium hydroxide (KOH) solution. Here is an introduction to its application, corrosion resistance, and potential problems:
Application: SS316L stainless steel is commonly used in the manufacturing of KOH tanks due to its relatively good corrosion resistance to alkalis. It is often applied in industries such as electroplating, chemical manufacturing, and hydrogen production. For example, in some hydrogen production devices, KOH solution is used as an electrolyte, and SS316L tanks are used to store it.
Corrosion Resistance: SS316L stainless steel has a certain degree of corrosion resistance to KOH solutions. A study has shown that in KOH solutions with concentrations of 5g/L, 30g/L, and 50g/L, the corrosion rates of SS316L are 0.457μm/year, 2.362μm/year, and 5.613μm/year, respectively, indicating that the corrosion rate increases with the increase of KOH concentration. However, within a certain concentration and temperature range, SS316L can maintain relatively stable performance.
Potential Problems: In practical applications, SS316L tanks may suffer from alkali - induced stress corrosion cracking (SCC), especially under the combined action of stress and high - temperature KOH solutions. For example, in a nuclear power plant, the lower head of a 316L austenitic stainless steel KOH solution storage tank cracked after 8 years of service. The cracks were mainly caused by the combined action of residual stress and KOH solution, and the cracking mechanism was the film rupture theory of alkali - induced stress corrosion cracking.
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